With the rapid development of science and technology, dichlorosilane (CAS No. 4109-96-0), as an important inorganic compound, has shown broad application prospects and huge development potential in the fields of chemical industry, electronics, materials science, etc. According to the latest market data, the market demand for dichlorosilane continues to grow, especially in the field of semiconductor manufacturing, where its application value as a silicon source is becoming increasingly prominent.

Dichlorosilane has the advantages of decomposition at lower temperatures and high silicon crystal growth rate, making it an ideal choice for the starting material of semiconductor silicon layers in microelectronics. In addition, dichlorosilane is also used for polysilicon epitaxial growth and chemical vapor deposition of silicon dioxide and silicon nitride. Its silicon content is higher than that of trichlorosilane and silicon tetrachloride, and it is more efficient in depositing silicon, and the deposition temperature is lower than that of other chlorosilanes.

With the increasing global demand for semiconductor materials, the production and application technology of dichlorosilane is also constantly improving. At present, many domestic and foreign companies are increasing their research and development efforts to improve the purity and output of dichlorosilane to meet market demand.