Dichlorosilane (CAS No. 4109-96-0) is an important raw material in semiconductor manufacturing, and its application prospects are becoming increasingly broad. With the rapid development of the global semiconductor industry, the demand for high-quality silicon sources continues to increase. Dichlorosilane has become an ideal choice in semiconductor manufacturing due to its unique chemical properties and excellent physical properties.

Dichlorosilane has the advantages of decomposing at relatively low temperatures and having a high silicon crystal growth rate, which enables it to play an important role in semiconductor manufacturing. Especially in the epitaxial process, dichlorosilane as a silicon source can significantly improve the quality and performance of semiconductor materials.

In addition, dichlorosilane is also used in the fields of polysilicon epitaxial growth and chemical vapor deposition of silicon dioxide and silicon nitride. As these fields continue to develop, the market demand for dichlorosilane is also increasing.