In semiconductor manufacturing, dichlorosilane is used as a raw material for chemical vapor deposition (CVD) to generate high-purity silicon films. Its high reactivity and controllability make it an ideal choice for manufacturing integrated circuits and solar cells. In addition, dichlorosilane can also be used to prepare high-performance materials such as silicon nitride and silicon carbide, further improving the performance of semiconductor devices.
To learn more, click here
https://www.siliconematerial.net//product-dichorosilicon--4109-96-0.html
