Molecular Structure Reveals the Thermal Stability of Polysiloxane

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A recent professional article analyzes the thermal resistance mechanism of polysiloxane at the molecular level, correcting the industry’s long-standing bias of judging materials merely by temperature resistance figures. The Si-O-Si main chain endows polysiloxane with excellent thermal stability. The bond energy of Si-O bonds is much higher than that of C-C and C-O bonds, preventing the molecular framework from breaking under high temperatures. Polysiloxane consists of four structural units: M, D, T and Q. T and Q units form dense 3D cross-linked networks to enhance coating stability, while excessive cross-linking will lead to brittleness and cracks. Side groups such as methyl and phenyl affect adhesion, flexibility and oxidation resistance greatly. The article points out that evaluating high-temperature resistant coatings should focus on the actual performance of coatings after high temperature and thermal cycling, including cracking, chalking and peeling, rather than just extreme temperature resistance. It also puts forward eight evaluation criteria, offering practical references for industrial research, development and material selection. https://www.tiktok.com/@mia_iota/video/7597717976720149782

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